One‐step electrochemical deposition to achieve superhydrophobic cobalt incorporated amorphous carbon‐based film with self‐cleaning and anti‐corrosion

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EarlyView Article

  • Published: Dec 11, 2017
  • Author: Shengguo Zhou, Xiaobo Zhu, Qingqing Yan
  • Journal: Surface and Interface Analysis

Exploiting a superhydrophobic surface is very significant due to its excellent water repellency which has many practical applications in various fields. In this work, the cobalt incorporated amorphous carbon‐based (Co/a‐C:H) film was prepared successfully on Si substrate via a simple 1‐step electrochemical deposition where electrochemical deposition technology was using cobalt (II) acetylacetonate methanol solution as electrolyte under high voltage, atmospheric pressure, and low temperature. Surprisingly, the as‐prepared film showed a superior superhydrophobic surface with a water contact angle of 153 ± 1° and a sliding angle of 7.6° without any further modification of low surface energy materials. Especially, the tape adhesive, corrosion resistance, and self‐cleaning tests demonstrated that the as‐prepared carbon‐based film could possess fairly well adhesion, superior anti‐corrosion resistance, and self‐cleaning ability, respectively. It indicated that the superhydrophobic Co/a‐C:H film might have potential promising applications in the field of anti‐fouling, anti‐corrosion, and drag resistance, such as the above‐deck structures on icebreaker vessels, ship hulls, and offshore wind turbine blades.

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